http://rdf.ncbi.nlm.nih.gov/pubchem/reference/201111400

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Predicate Object
contentType Journal Article
issn 0272-9172
1946-4274
pageRange 197-
publicationName MRS Online Proceedings Library
startingPage 197
bibliographicCitation Jeng S, Taylor K, Chang M, Ting L, Lee C, Mcanally P, Seha T, Numata K, Tanaka T, Havemann RH. Process Integration Of Low-Dielectric-Constant Materials. MRS Advances. 1995;381():197. doi: 10.1557/proc-381-197.
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date 1995
identifier https://doi.org/10.1557/proc-381-197
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http://rdf.ncbi.nlm.nih.gov/pubchem/journal/33231
https://portal.issn.org/resource/ISSN/0272-9172
language English
source https://scigraph.springernature.com/
https://www.crossref.org/
title Process Integration Of Low-Dielectric-Constant Materials

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