reference/201383281

Predicate	Object
contentType	Book Chapter
endingPage	1032
isbn	978-4-431-68307-0 978-4-431-68305-6
pageRange	1029-1032
publicationName	Advances in Superconductivity V
startingPage	1029
bibliographicCitation	Oishi T, Takami T, Kojima K, Kuroda K, Wada O. Dry Etching of BiSrCaCuO Superconducting Thin Films Using Argon and Ethane. 1993. In: Advances in Superconductivity V. : Springer Japan; 1993.
creator	http://rdf.ncbi.nlm.nih.gov/pubchem/author/MD5_94a9cced3f28daa28c2bdf3d0a26ace6 http://rdf.ncbi.nlm.nih.gov/pubchem/author/MD5_fdd1b244d153b48933a5ff1ecac46885 http://rdf.ncbi.nlm.nih.gov/pubchem/author/MD5_0c653600336a9775a45518d94fe9a83c http://rdf.ncbi.nlm.nih.gov/pubchem/author/MD5_754a70845067d225f3d2d128736a5d10 http://rdf.ncbi.nlm.nih.gov/pubchem/author/MD5_6c90cb19ba522c90b2726d28c77978f2
date	1993
identifier	https://doi.org/10.1007/978-4-431-68305-6_231
isPartOf	https://isbnsearch.org/isbn/978-4-431-68307-0 https://isbnsearch.org/isbn/978-4-431-68305-6
language	English
source	https://scigraph.springernature.com/ https://www.crossref.org/
title	Dry Etching of BiSrCaCuO Superconducting Thin Films Using Argon and Ethane

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