http://rdf.ncbi.nlm.nih.gov/pubchem/reference/212269813

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Predicate Object
contentType Journal Article
issn 1946-4274
0272-9172
pageRange 421-
publicationName MRS Online Proceedings Library
startingPage 421
bibliographicCitation Beyer R, Burghardt H, Reich R, Thomas E, Grambole D, Herrmann F, Scholz T, Albrecht J, Zahn DRT, Gessner T. Trapping Behavior of Thin Siliconoxynitride Layers Prepared by Rapid Thermal Processing. MRS Advances. 1996;428():421. doi: 10.1557/proc-428-421.
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date 1996
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https://portal.issn.org/resource/ISSN/0272-9172
language English
source https://scigraph.springernature.com/
https://www.crossref.org/
title Trapping Behavior of Thin Siliconoxynitride Layers Prepared by Rapid Thermal Processing

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