http://rdf.ncbi.nlm.nih.gov/pubchem/reference/25572172

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Predicate Object
contentType Journal Article
endingPage 10
issn 0003-6935
1539-4522
issueIdentifier 34
pageRange 6901-10
publicationName Applied Optics
startingPage 6901
bibliographicCitation Richardson M, Silfvast WT, Bender HA, Hanzo A, Yanovsky VP, Jin F, Thorpe J. Characterization and control of laser plasma flux parameters for soft-x-ray projection lithography. Appl Opt. 1993 Dec 01;32(34):6901–10. doi: 10.1364/ao.32.006901. PMID: 20856543.
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date 1993-12-01^^<http://www.w3.org/2001/XMLSchema#date>
identifier https://pubmed.ncbi.nlm.nih.gov/20856543
https://doi.org/10.1364/ao.32.006901
isPartOf http://rdf.ncbi.nlm.nih.gov/pubchem/journal/22496
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https://portal.issn.org/resource/ISSN/1539-4522
language English
source https://www.crossref.org/
https://pubmed.ncbi.nlm.nih.gov/
title Characterization and control of laser plasma flux parameters for soft-x-ray projection lithography

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