"Layout Decomposition Approaches for Double Patterning Lithography."

Andrew B. Kahng et al. (2010)

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DOI: 10.1109/TCAD.2010.2048374

access: closed

type: Journal Article

metadata version: 2020-09-24

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Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Yao:
Layout Decomposition Approaches for Double Patterning Lithography. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 29(6): 939-952 (2010)

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