| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b8b2ec30f41266773d22a903d3f1e962 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4586
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45557
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4412 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-52 |
| filingDate |
2017-12-11^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_36f8a8c4950971468a7e14c3ad10834a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_60757ab22fbaba4da6d6de7f75bc08de
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a5370f10e01823fc1f88079e60d189b3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a98948c465b1ec18c27b3935b6591559
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e0f74eb18241693d83a0ef578545b3bc |
| publicationDate |
2018-06-29^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-108220923-A |
| titleOfInvention |
Chemical Vapor Deposition Equipment |
| abstract |
A chemical vapor deposition apparatus comprises a ballast gas source and a mass flow controller, wherein the ballast gas source is arranged on the upstream side of a separation device, and controls the pressure in a reaction chamber by controlling the flow rate of the ballast gas . The pressure response of the reaction chamber is accelerated due to the smaller space between the reaction chamber and the nodes connected to the ballast gas source. |
| priorityDate |
2016-12-09^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |