| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-029
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2004 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2021-03-12^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_974e91a6a88af32de4ee577276623806
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c7e854794d72d7b9f39bdc812bef623a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_01cbe0dfc87fb115bd7827b6918e23e0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cc67165133e1524141a4e567b39d6bac |
| publicationDate |
2022-11-18^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-115362412-A |
| titleOfInvention |
Actinic radiation-sensitive or radiation-sensitive resin composition, actinic radiation-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, actinic radiation-sensitive or radiation-sensitive resin composition for photomask production, and photo Mask manufacturing method |
| abstract |
According to the present invention, there are provided an actinic radiation-sensitive or radiation-sensitive resin composition, an actinic radiation-sensitive or radiation-sensitive film using the composition, a method for forming a pattern, a method for manufacturing an electronic device, and a photosensitive resin composition for producing a photomask. A method for producing an actinic radiation-sensitive or radiation-sensitive resin composition and a photomask, the actinic radiation-sensitive or radiation-sensitive resin composition comprising a resin whose solubility in a developer is changed by the action of an acid, A photoacid generator (A) having a group whose polarity is changed by decomposition by the action of an acid, a photoacid generator (B) generating an acid having a pKa higher than that generated by the photoacid generator (A), and basic compound. |
| priorityDate |
2020-03-30^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |