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level 8^^<http://www.w3.org/2001/XMLSchema#integer>
symbol G03F1/22
modified 2023-08-01^^<http://www.w3.org/2001/XMLSchema#date>
title Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
type http://data.epo.org/linked-data/def/cpc/SubGroup
broader http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-00

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