http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-22
Outgoing Links
Predicate | Object |
---|---|
concordantIPC | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-22 |
level | 8^^<http://www.w3.org/2001/XMLSchema#integer> |
symbol | G03F1/22 |
modified | 2023-08-01^^<http://www.w3.org/2001/XMLSchema#date> |
title | Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof |
type | http://data.epo.org/linked-data/def/cpc/SubGroup |
broader | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-00 |
Incoming Links
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