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publicationDate 2009-09-16^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-2100325-A1
titleOfInvention Water-based polishing slurry for polishing silicon carbide single crystal substrate, and polishing method for the same
abstract A water-based polishing slurry for polishing a silicon carbide single crystal, wherein the slurry comprises abrasive particles having a mean particle size of 1 to 400 nm and an inorganic acid, and the slurry has a pH of less than 2 at 200C.
priorityDate 2006-12-27^^<http://www.w3.org/2001/XMLSchema#date>
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