http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2554613-A1
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8e0bf0928b608797b70bbc2b91c7e52e |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F3-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30625 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F3-06 |
filingDate | 2011-08-01^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3ee5b8569dd2e22438b2897404692b0c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_29c2885eae3a0130ed07b6be5b69c474 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb88b28cfd3a1bafb9700671a2d52157 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a94e945a56a29bb7ae1a3d2d89e0ae42 |
publicationDate | 2013-02-06^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | EP-2554613-A1 |
titleOfInvention | A process for the manufacture of semiconductor devices comprising the chemical mechanical polishing of elemental germanium and/or si1-xgex material in the presence of a cmp composi-tion comprising a specific organic compound |
abstract | A process for the manufacture of semiconductor devices comprising the chemical mechanical polishing of elemental germanium and/or Si 1-x Ge x material with 0.1 ≤ x < 1 in the presence of a chemical mechanical polishing (CMP) composition comprising: n(A) inorganic particles, organic particles, or a mixture or composite thereof, n(B) at least one type of an oxidizing agent, n(C) at least one type of an organic compound which comprises at least {k} moieties (Z), but excluding salts whose anions are inorganic and whose only organic cation is [NR 11 R 12 R 13 R 14 ] + , nwherein {k} is 1, n(Z) is a hydroxyl (-OH), alkoxy (-OR 1 ), heterocyclic alkoxy (-OR 1 as part of a heterocyclic structure), carboxylic acid (-COOH), carboxylate (-COOR 2 ), amino (-NR 3 R 4 ), heterocyclic amino (-NR 3 R 4 as part of a heterocyclic structure), imino (=N-R 5 or -N=R 6 ), heterocyclic imino (=N-R 5 or -N=R 6 as part of a heterocyclic structure), phosphonate (-P(=O)(OR 7 )(OR 8 ) ), phosphate (-OP(=O)(OR 9 )(OR 10 ) ), phosphonic acid (-P(=O)(OH) 2 ), phosphoric acid (-O-P(=O)(OH) 2 ) moiety, or their protonated or deprotonated forms, nR 1 , R 2 , R 7 , R 9 is - independently from each other - alkyl, aryl, alkylaryl, or arylalkyl, nR 3 , R 4 , R 5 , R 8 , R 10 is - independently from each other - H, alkyl, aryl, alkylaryl, or arylalkyl, nR 6 is alkylene, or arylalkylene, nR 11 R 12 , R 13 is - independently from each other - H, alkyl, aryl, alkylaryl, or arylalkyl, and R 11 , R 12 , R 13 does not comprise any moiety (Z), nR 14 is alkyl, aryl, alkylaryl, or arylalkyl, and R 14 does not comprise any moiety (Z), nand n(D) an aqueous medium. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019181269-A1 |
priorityDate | 2011-08-01^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
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