| abstract |
(57) [Summary] [PROBLEMS] To replace toluene and xylene with a solvent having a high safety and high cleaning performance, and to remove unnecessary resist on the peripheral portion and the back surface after applying a rubber negative resist on a silicon wafer. Provided is a resist removing solvent useful for cleaning and removing a silicon wafer without leaving stains or sagging. SOLUTION: A resist removing solvent containing one or a mixture of two or more aliphatic hydrocarbons having 6 to 20 carbon atoms is used. As the aliphatic hydrocarbon, at least one aliphatic hydrocarbon selected from the group consisting of paraffinic hydrocarbons, isoparaffinic hydrocarbons, and naphthenic hydrocarbons can be preferably used. |