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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B9-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B7-02
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
filingDate 2002-11-20^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b81668511a947034a03a71a9c152dc06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1f480d288c1ce36389b190a2b3364370
publicationDate 2003-08-15^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2003228172-A
titleOfInvention Method for manufacturing pattern-formed body
abstract (57) [Problem] The present invention has been made in view of the above-mentioned problems, and it is possible to form a pattern with high accuracy at the time of manufacturing a pattern-formed body, and to reduce cost and environmental load. It is an object of the present invention to provide a method for manufacturing a pattern formed body having a small particle size. SOLUTION: The present invention provides a pattern forming method for preparing a substrate for a pattern forming body having a base and a functional thin film formed on the base, decomposed and removed by the action of a photocatalyst, and having a function in the film itself. Body substrate preparation step, the photocatalyst containing layer and the functional thin film in the photocatalyst containing layer and the photocatalyst containing layer side substrate having a substrate, after arranging a gap so as to be 200μm or less, By irradiating energy from a predetermined direction, The above object is achieved by providing a method of manufacturing a pattern formed body, comprising: a pattern forming step of forming a pattern in which the functional thin film is decomposed and removed in a pattern.
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