Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3d1b857f9685e531d6c07a9d8e0763c5 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-458 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-683 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-68 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 |
filingDate |
2002-02-26^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1d765def4eb0330992ce3052c939ebc5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_114bb375c1e3a9355585f1ae358a08e4 |
publicationDate |
2003-09-05^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2003249544-A |
titleOfInvention |
Electrostatic chuck and method for manufacturing the same |
abstract |
(57) [Summary] [Object] To provide an electrostatic chuck in which generation of particles due to friction with an object to be attracted such as a silicon wafer is small. [Constitution] Insulating layer 4 mainly composed of PBN or C-PBN Is formed on the surface of the insulating layer by dry-etching a non-mask region on the surface of the insulating layer with an etching gas plasmatized in a vacuum chamber to form convex portions 7 continuous in a mesh on the surface of the insulating layer. Remove. The dry etching is preferably performed using both chemical etching with oxygen gas and physical etching with an inert gas such as argon. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8238072-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7772098-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008520087-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010149720-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008300374-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101892911-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3686922-A4 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017034042-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20140004062-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013535842-A |
priorityDate |
2002-02-26^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |