http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003249544-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3d1b857f9685e531d6c07a9d8e0763c5
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-458
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-683
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
filingDate 2002-02-26^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1d765def4eb0330992ce3052c939ebc5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_114bb375c1e3a9355585f1ae358a08e4
publicationDate 2003-09-05^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2003249544-A
titleOfInvention Electrostatic chuck and method for manufacturing the same
abstract (57) [Summary] [Object] To provide an electrostatic chuck in which generation of particles due to friction with an object to be attracted such as a silicon wafer is small. [Constitution] Insulating layer 4 mainly composed of PBN or C-PBN Is formed on the surface of the insulating layer by dry-etching a non-mask region on the surface of the insulating layer with an etching gas plasmatized in a vacuum chamber to form convex portions 7 continuous in a mesh on the surface of the insulating layer. Remove. The dry etching is preferably performed using both chemical etching with oxygen gas and physical etching with an inert gas such as argon.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8238072-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7772098-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008520087-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010149720-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008300374-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101892911-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3686922-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017034042-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20140004062-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013535842-A
priorityDate 2002-02-26^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559551
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415712843
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559585
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5416
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419569950
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559581
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419569951
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419569943
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457444288
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23991
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559541
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523291
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556970
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID25135
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID947
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID456171974
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23968
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458357694
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5461123
http://rdf.ncbi.nlm.nih.gov/pubchem/anatomy/ANATOMYID1969
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23935
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID66227
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID297
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID977
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5462311

Showing number of triples: 1 to 51 of 51.