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filingDate 2000-05-24^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2003-01-07^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2003500866-A
titleOfInvention Doping of crystalline substrate
abstract (57) [Summary]nA method of making a doped crystalline substrate having a crystal lattice is provided. The method includes providing a crystalline substrate having a crystal lattice; implanting dopant atoms into the crystalline substrate to create a doped layer. Thereafter or simultaneously, ions are implanted into the crystalline substrate to create a damaged layer. This damaged layer is separated from the doped layer and contains vacancies and interstitial atoms of the crystalline substrate. Interstitial atoms are diffused from the damaged layer into vacancies in the doped layer, reducing damage therein.
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priorityDate 1999-05-31^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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