http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004031684-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_73ebc284a55d5daf0e209d6186c9e65c |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01J5-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01J5-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01J5-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01J1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61B5-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61B5-01 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L35-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01J5-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L35-34 |
| filingDate | 2002-06-26^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_96be0a62a29194700af3f0b13113b1bd |
| publicationDate | 2004-01-29^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2004031684-A |
| titleOfInvention | Manufacturing method of infrared detecting element, infrared detecting element, and ear thermometer |
| abstract | A method of manufacturing an infrared detection element capable of forming an external electrode portion without increasing the number of production steps and without causing a defect or the like on a semiconductor substrate or the like, an infrared detection element, and an ear type having an infrared detection element Providing body temperature forms. A thermopile forming step of forming a plurality of thermocouples having a hot junction and a cold junction on a semiconductor substrate and connecting them in series to form a thermopile, and a thin film section for thinning the semiconductor substrate. A method for manufacturing an infrared detecting element comprising: a forming step; and an external electrode section forming step of forming an external electrode section 41 for connecting the thermopile to the outside, wherein the external electrode section is formed in the external electrode forming step. Then, the thin film portion 4 is formed by etching, and the etching is performed by using a solution obtained by adding ammonium peroxodisulfate to a solution obtained by dissolving silicon in an aqueous solution of tetramethylammonium hydroxide as an etching solution. [Selected drawing] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009189784-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8362584-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-112011101444-T5 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9759613-B2 |
| priorityDate | 2002-06-26^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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