http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006126818-A

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filingDate 2005-09-28^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7d3bc47946bf3675db76302883aceb2a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c2a9aacf507db12b95a8f92ddad3e63f
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publicationDate 2006-05-18^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2006126818-A
titleOfInvention Chemically amplified resist composition
abstract [PROBLEMS] To not only greatly reduce the number of defects on a resist coating film with excellent filtration characteristics, but also to greatly reduce defects on the resist coating film due to deterioration of the resist solution over time, and long-term storage stability There is provided a solution for a semiconductor coating film having: A semiconductor coating comprising a treated resin (1) obtained by contacting a crude resin (1) with activated carbon at 40 to 90 ° C. and then contacting with a diatomaceous earth and / or silica gel. Membrane solution. The semiconductor coating film solution as described above, wherein the semiconductor coating film solution is a chemically amplified resist composition and contains an acid generator and a solvent together with the treated resin (1). [Selection figure] None
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