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classificationIPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D69-02
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
filingDate 2007-08-03^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_75af11bcf590e1f29acf022c69c364f8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_503616f732fbff30ea74dd40fe3cf249
publicationDate 2009-02-19^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2009037108-A
titleOfInvention Method for producing resin solution for photoresist, photoresist composition and pattern forming method
abstract 【Task】 An object of the present invention is to provide a photoresist composition having good filterability that enables uniform pattern formation, and is a resin solution for photoresist that is stable for a long period of time, that is, has a filtration performance even when stored for a long period of time. An object of the present invention is to provide a photoresist resin solution that does not decrease. [Solution] The present invention relates to a photoresist resin characterized by filtering a solution containing a photoresist resin that becomes alkali-soluble by an acid at 30 to 90 ° C. by heating and aging for 30 minutes or more, and then filtering with a filter medium having a pore diameter of 1 μm or less. A method for producing a solution is provided. [Selection figure] None
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priorityDate 2007-08-03^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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