| abstract |
When immobilizing a target molecule using a monomolecular film having a silicon oxide chain on a substrate, a chemically amplified resist is directly applied in order to simplify the process while performing high-precision processing. Provided is a method for producing a substrate for producing a microarray, which does not cause a problem of resolution degradation or peeling even when applied on a substrate, and more easily obtains a substrate for immobilization than a conventional process. For the purpose. A method of manufacturing a substrate for producing a microarray, comprising at least the following general formula (1) on the substrate: Y 3 Si- (CH 2) m -X (1) (In the formula, m represents an integer of 3 to 20, X represents a hydroxyl group precursor functional group. Y independently represents a halogen atom or an alkoxy group having 1 to 4 carbon atoms.) A process for forming a monomolecular film using a silane compound represented by formula (I), and a process for converting the hydroxyl precursor functional group represented by X to a hydroxyl group. [Selection] Figure 1 |