| abstract |
The present invention provides a photosensitive resin composition that provides a light-shielding color filter having excellent uniformity of coating film thickness on a wafer. Furthermore, the light-shielding color filter formed with the said photosensitive resin composition, its manufacturing method, and a solid-state image sensor are provided. SOLUTION: (A) Titanium black, (B) polymerizable compound, (C) resin, (D) photopolymerization initiator, (E) silicone surfactant and / or fluorine surfactant, and ( F) An organic solvent. A photosensitive resin composition characterized by comprising: A light-shielding color filter having a pattern formed using the photosensitive resin composition. A solid-state imaging device comprising the light-shielding color filter. [Selection figure] None |