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publicationDate 2020-10-21^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-I708123-B
titleOfInvention Photoresist composition and method of manufacturing thin film transistor substrate using the same
abstract A photoresist composition includes about 0.1 to about 30 parts by weight of a photo-initiator, about 1 to 50 parts by weight of a first acrylate monomer including at least five functional groups, about 1 to 50 parts by weight of a second acrylate monomer including at most four functional groups with respect to about 100 parts by weight of an acryl-copolymer.
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