http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013160813-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7
classificationIPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-12
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
filingDate 2012-02-01^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8b61fb1219b6bedfe5ba0f57f6bbdbd6
publicationDate 2013-08-19^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2013160813-A
titleOfInvention Resist composition and pattern forming method
abstract A resist composition having excellent lithography properties and a resist pattern forming method are provided. A resist composition comprising a base material component (A) whose solubility in a developing solution is changed by the action of an acid and an acid generator component (B) that generates an acid upon exposure, wherein the acid generation The agent component (B) contains an acid generator (B1) composed of a compound represented by the general formula (b1-1) [X is a hydrocarbon having 1 to 15 carbon atoms which may have a substituent. R 2 is an optionally substituted hydrocarbon group having 1 to 10 carbon atoms, R 3 is a fluorinated alkyl group, v1 is an integer of 1 to 5, and v2 is It is an integer of 0-4. Z + is an organic cation. ] [Chemical 1] [Selection figure] None
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014029489-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013183689-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014002368-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018039794-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014029491-A
priorityDate 2012-02-01^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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