http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014029491-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
filingDate 2013-06-12^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a144f3526dc1d67cb5c2c69f8714bf36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_36616a7dfdb0a7e59c6f4b808e61f918
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_04d3730b6ad527289e0c18d5b14850d2
publicationDate 2014-02-13^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2014029491-A
titleOfInvention Resist composition and method for producing resist pattern
abstract A resist composition having excellent pattern collapse resistance is provided. A resist composition containing a resin having a structural unit represented by formula (I) and an acid generator represented by formula (II). [Selection figure] None
priorityDate 2012-06-25^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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