| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_73e224665ceb7b15f8e66dfd0ee245c6 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-513
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-545
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-507
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45578
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-30 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-324
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-265
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-513
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 |
| filingDate |
2014-02-04^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_008e05a33536838793e058823d1efa3b |
| publicationDate |
2015-08-13^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2015146279-A |
| titleOfInvention |
Plasma processing apparatus and method |
| abstract |
An object of the present invention is to provide a plasma processing apparatus and method capable of efficiently generating a long thermal plasma with excellent uniformity and suppressing electrostatic damage. A substrate 1 on which a thin film 2 is formed is disposed opposite to an inductively coupled plasma torch unit T. The coil 3 is disposed in the vicinity of the first ceramic block 4 and the second ceramic block 5. Since the high-frequency electromagnetic field generated by the coil 3 is effectively shielded by the shield plate 13, the high-frequency electromagnetic field in the vicinity of the substrate 1 is considerably weakened, so that electrostatic damage hardly occurs. [Selection] Figure 1 |
| priorityDate |
2014-02-04^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |