| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2014-10-17^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_11e1e95573cdbb69e17880f0542427b6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_022dd828ba016d1a6cf5f126c039007a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_94cedf82f9dd732182f85b85735c22f0 |
| publicationDate |
2016-05-16^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2016080910-A |
| titleOfInvention |
Resist pattern forming method |
| abstract |
A resist pattern forming method is provided. A step A of forming a first resist pattern on a support, a step B of applying a basic composition so as to cover the first resist pattern, and a step in the basic composition A step C of neutralizing a base and the first resist pattern to form a developer-insoluble region on the surface of the first resist pattern; and a step D of developing the coated first resist pattern A resist pattern forming method, wherein the basic composition contains a basic component, and the basic component contains a polymer compound having a structural unit (x0) represented by the general formula (x0-1). [Rx1; a substituent having a nitrogen atom. ] [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017207569-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017010015-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016158507-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2016158507-A1 |
| priorityDate |
2014-10-17^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |