| abstract |
Pattern processing compositions and methods are particularly applicable in the manufacture of semiconductor devices having high resolution patterns. The first block includes units formed from a first monomer that includes an ethylenically unsaturated polymerizable group and a hydrogen acceptor group that is a nitrogen-containing group, and the second block includes an ethylenically unsaturated group. A composition comprising a unit formed from a second monomer containing a saturated polymerizable group and a cycloaliphatic group, comprising a block copolymer containing a first block and a second block, and a pattern processing method using the same . [Selection] Figure 2 |