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filingDate 2015-09-15^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3aa197a0faee499992f0da36115aa856
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publicationDate 2017-03-23^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2017058447-A
titleOfInvention Resist material and pattern forming method
abstract A resist having a high dissolution contrast in both a positive resist material and a negative resist material, a reduced edge roughness, and no dimensional change during a standing time between post-exposure baking after exposure and development. A material and a pattern forming method using the same are provided. A resist material comprising a sulfonium salt represented by the following formula (A) and a base polymer. [Selection figure] None
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