| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-01074 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45553
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28562
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28556
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28506
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-0281
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45527
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45525
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76877
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76876
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-08 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-532 |
| filingDate |
2017-04-26^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f446a9e1f0b71ae71fb126eb5645b1e6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_acd0b01b5ea6cb68db2acb9eed51d305
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_37b50f31aa56819b6c9331379170fb44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a8edb8226e450c079323e8c5cacbf035
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8659b09931397c648360957044c96e4a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b51dc0f3f77078dc9b8a157af843b191
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_43e4afcfc7e9e3f16049c3051983e450 |
| publicationDate |
2018-11-22^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2018184636-A |
| titleOfInvention |
Method for forming a tungsten film |
| abstract |
A method for forming a tungsten film having a low resistance is provided. A method of forming a tungsten film includes a step of forming a first tungsten film on a substrate and a step of forming a second tungsten film on the first tungsten film. In the step of forming the first tungsten film, the source gas containing tungsten and the diborane gas are alternately supplied to the substrate together with the first carrier gas. In the step of forming the second tungsten film, the source gas containing tungsten and the hydrogen gas are alternately supplied to the substrate having the first tungsten film together with the second carrier gas. The first carrier gas is nitrogen gas. The second carrier gas is composed of at least one kind of inert gas, and contains a rare gas at a rate of 70% or more of the total flow rate of the second carrier gas. [Selection] Figure 1 |
| priorityDate |
2017-04-26^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |