| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-80
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-46 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-06 |
| filingDate |
2020-07-17^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b6f15efa7f293cac37028910748f4eaf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1a31af3df617f872a4a66f6d11c3f425
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2a54727ddb4b61f7959468673c5fbc0d |
| publicationDate |
2020-11-26^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2020190738-A |
| titleOfInvention |
Photomask blank and photomask manufacturing method |
| abstract |
A transparent substrate 1 and a light-shielding film 2 formed on the transparent substrate and containing silicon and nitrogen and not containing a transition metal are provided, and the light-shielding film contains silicon and nitrogen and contains a transition metal. A photomask blank that does not contain and is composed of multiple layers including a light-shielding layer in which the ratio of nitrogen to the total of silicon and nitrogen is 3 atomic% or more and 50 atomic% or less. [Effect] As a photomask blank having a light-shielding film containing silicon, it is possible to provide a photomask blank having a light-shielding film having a thin film thickness and good workability. [Selection diagram] Fig. 1 |
| priorityDate |
2016-03-02^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |