| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-76
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0275 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B19-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-24 |
| filingDate |
2014-11-21^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2016-11-09^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2016-11-09^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-6023777-B2 |
| titleOfInvention |
Extreme ultraviolet lithography process and mask with reduced shadow effect and improved intensity |
| priorityDate |
2013-11-22^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |