http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H03142821-A

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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-308
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-50
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filingDate 1989-10-27^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a36308878e3ba0e0c0c3529e249446d3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5f6f50eeb1ccfaa4906224167d67cef1
publicationDate 1991-06-18^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H03142821-A
titleOfInvention Release agent for photoresist
abstract PURPOSE: To reduce risk, to prevent aged deterioration in release-power and to acquire release effect to a photoresist of both positive and negative by containing a specified rate of a specified halobenzenesulfonic acid and phenole compound, respectively. n CONSTITUTION: Halobenzenesulfonic acid expressed in an expression (I) is contained by 1 to 20wt.% and phonole compound is contained by 5 to 50wt.%. In the expression (I), X expresses halogen atom such as fluorine atom, chlorine atom, bromine atom, and iodine atom; a compound which expresses chlorine atom is preferable in respect of cost. A mix ratio of halobenzenesulfonic acid is preferably 1 to 10wt.%. Phenole, xylenol, cresol, etc., are especially preferably as phenole compound; a mix ratio thereof is preferably 10 to 40wt.%. Although it does not contain chlorine solvent whose use is largely restricted, it is the equal of a conventional one from the viewpoint of release-power and hardly corrode metal such as aluminum. n COPYRIGHT: (C)1991,JPO&Japio
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4596894-B2
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priorityDate 1989-10-27^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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