http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H03142821-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_05f852421c03edc334e958a28ebb22f9 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-308 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate | 1989-10-27^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a36308878e3ba0e0c0c3529e249446d3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5f6f50eeb1ccfaa4906224167d67cef1 |
publicationDate | 1991-06-18^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-H03142821-A |
titleOfInvention | Release agent for photoresist |
abstract | PURPOSE: To reduce risk, to prevent aged deterioration in release-power and to acquire release effect to a photoresist of both positive and negative by containing a specified rate of a specified halobenzenesulfonic acid and phenole compound, respectively. n CONSTITUTION: Halobenzenesulfonic acid expressed in an expression (I) is contained by 1 to 20wt.% and phonole compound is contained by 5 to 50wt.%. In the expression (I), X expresses halogen atom such as fluorine atom, chlorine atom, bromine atom, and iodine atom; a compound which expresses chlorine atom is preferable in respect of cost. A mix ratio of halobenzenesulfonic acid is preferably 1 to 10wt.%. Phenole, xylenol, cresol, etc., are especially preferably as phenole compound; a mix ratio thereof is preferably 10 to 40wt.%. Although it does not contain chlorine solvent whose use is largely restricted, it is the equal of a conventional one from the viewpoint of release-power and hardly corrode metal such as aluminum. n COPYRIGHT: (C)1991,JPO&Japio |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4596894-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8153357-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010231223-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005202363-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8431333-B2 |
priorityDate | 1989-10-27^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
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