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filingDate 1991-11-06^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_da78baee2ade9baae6c6ad8e7ebc138b
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publicationDate 1993-05-25^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H05127383-A
titleOfInvention Photosensitive resin composition
abstract (57) [Summary] (Correction) [Structure] (A) Polyamic acid ester having a weight average molecular weight of 3000 to 300,000, which is obtained by gel permeation chromatography and represented by polystyrene by gel permeation chromatography, and (B) absorption. A photosensitive resin composition containing a sensitizer having a maximum wavelength (λmax) of 330 to 500 nm as an essential component. [Chemical 1] [Effect] It is possible to obtain a photosensitive polyimide resin that retains excellent photosensitivity and is lightly colored after curing, and does not cause trouble in the assembly process even when used in a semiconductor device. it can.
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