| abstract |
(57) [Summary] [Structure] (A) (a) 5-60 mol% of the hydroxyl groups are t- For a resin component composed of hydrogenated polyhydroxystyrene having a hydrogenation rate of 1 to 40 mol% and a weight average molecular weight of 3,000 to 20,000 protected by a butoxycarbonyl group and (b) cresol novolac resin, (B) naphthokin-1, A positive resist composition containing 2-diazide-4-sulfonic acid ester. [Effects] It is a chemically amplified type, has high sensitivity and high resolution, and is improved in deterioration of resolution characteristics from exposure to development processing, and is particularly preferably used as a resist for excimer laser. |