| abstract |
(57) [Summary] [Structure] A polymer having a weight average molecular weight of 10 3 to 10 6 comprising repeating structural units of the following formulas (Ia), (Ib) and formula (II), the polymer and the acid upon exposure to actinic radiation. A radiation-sensitive composition that can be used for a positive photoresist composed of at least one compound that produces a compound, a method for treating a substrate using the composition, a protective coating, and a relief structure. [Chemical 1] (Example of group: R 1 , R 3 to R 6 = H, A = direct bond, —O -, R 2 = -CH 2 COOC (CH 3) 2, R 7 = H, C 1-6 alkyl, -CH 2 OH, -CH 2 OCOC H 3 ) [Effect] The effect of delay time is largely suppressed, high thermal stability and resolution are exhibited, and it is suitable for use as a DUV positive photoresist. |