| abstract |
(57) Abstract: A deteriorated film formed by treatment such as dry etching, ashing, and ion implantation under more severe conditions is excellent in peelability, and a substrate on which Al or Al alloy is formed or Ti is formed. Disclosed is a resist stripping composition having an excellent effect of preventing corrosion on both of the formed substrates. SOLUTION: (a) hydroxylamines 2 to 30% by weight, (b) water 2 to 35% by weight, (c) amines 2 having an acid dissociation constant (pKa) of 7.5 to 13 in an aqueous solution at 25 ° C. ˜20% by weight, (d) 35-80% by weight of water-soluble organic solvent, and (e) 2-20% by weight of anticorrosive composition for resist. |