| abstract |
PURPOSE: To contrive the improvement in characteristics, film-forming speed, and reproducibility of the deposited film containing germanium and the uniformity of film quality, by a method wherein a specific activation seed previously activated in a space different from the film-forming space is used to carry out chemical reaction. n CONSTITUTION: In the film-forming space to form a deposited film 10 over a substrate 11, an activation seed produced by decomposing a compound containing silicon and halogen and an activation seed produced out of a film- forming compound containing germanium which chemically interacts with it are separately introduced, and the deposited film 10 is formed over the substrate 11 by making the activation seeds to carry out chemical reaction. This process allows the formed film 10 to receive no adverse effects caused by etching action or another action such as abnormal discharge because of no generation of plasma in the film-forming space to form the film 10. n COPYRIGHT: (C)1986,JPO&Japio |