http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102058912-B1
Outgoing Links
Predicate | Object |
---|---|
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32807 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32532 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
filingDate | 2016-03-02^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2019-12-24^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2019-12-24^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-102058912-B1 |
titleOfInvention | Apparatus for processing substrate |
abstract | The present invention provides a chamber for gas treating a substrate; A first electrode disposed inside the chamber and having a plurality of electrode bars facing the substrate and protruding toward the substrate; And two electrodes provided in the chamber and having a plurality of through-holes through which the electrode penetrates, wherein a distance between the first electrode and the second electrode is narrower than a distance between the electrode and the second electrode. do. |
priorityDate | 2016-03-02^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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