http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150127288-A

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filingDate 2014-04-04^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0ef58a1bb9ec60924e5ac12d9a312802
publicationDate 2015-11-16^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20150127288-A
titleOfInvention Resist removing liquid, resist removal method using same and method for producing photomask
abstract Provided is a resist removing liquid having excellent removability of a resist used for patterning a photomask for EUV lithography, a removing method using the same, and a manufacturing method of a photomask. A method for removing a resist by contacting a resist provided on a photomask substrate with a resist provided on a photomask substrate for patterning a photomask for EUV lithography, the method comprising the steps of: preparing a resist solution containing an alkaline compound and a specific nitrogen compound and water, And more preferably 50% by mass or more.
priorityDate 2013-04-17^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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