http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201300957-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_63415f052d55f580530dfc12b7adad17 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-18 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-235 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-23 |
| filingDate | 2012-05-18^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8937975b62900c1922df9655a13ae961 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e8e9ade1dbf2e08be2a5cea1a823ceea http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f1a9e4dcf369f6ceb07a6bacdff45ff3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e3e6fa7e2e7727b944d093c9fbfd4988 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c4c0a7c429a184a4ab7c374dfff1fb27 |
| publicationDate | 2013-01-01^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201300957-A |
| titleOfInvention | Positive photosensitive siloxane composition |
| abstract | The present invention provides a positive photosensitive siloxane composition which can form a pattern of high resolution, high heat resistance and high transparency, and can reduce insoluble solubility due to development residues and dissolved residues during pattern formation. Pattern defects caused by reattachment of objects. A positive photosensitive siloxane composition containing at least three kinds of polyoxoxanes and (II) diazonaphthoquinone derivatives having different (I) different dissolution rates in an aqueous solution of tetramethylammonium hydroxide And (III) a positive photosensitive decane composition of a solvent, wherein the polyoxyalkylene (I) comprises at least one of the following polyoxyalkylenes (Ia), and the following polyoxyalkylene (Ib) At least one of the following and at least one of the following polyoxyalkylene oxides (Ic); (A) polydecane oxide (Ia) The decane compound represented by the general formula (1) is in the presence of an acidic or basic catalyst Hydrolyzed and condensed, the pre-baked film is soluble in 5% by weight aqueous solution of tetramethylammonium hydroxide, and the polyoxane having a dissolution rate of 1,000 Å/sec or less; R1nSi(OR2)4-n (wherein R1 represents a linear, branched or cyclic alkyl group having 1 to 20 carbon atoms which may be replaced by an arbitrary methylene group by oxygen, or an aryl group having a carbon number of 6 to 20 and any hydrogen may be replaced by fluorine. n is 0 or 1; R2 represents an alkyl group having 1 to 5 carbon atoms; (B) polyoxyalkylene (Ib) hydrolyzes the decane compound of the formula (1) in the presence of an acidic or basic catalyst, Obtained by condensation, the film after prebaking is 2.38 wt% tetramethyl hydroxide a polyoxane having a dissolution rate of 4,000 Å/sec or more in an aqueous ammonium solution; (C) a polyoxane (Ic) hydrolyzing and condensing the decane compound of the formula (1) in the presence of an acidic or basic catalyst The film obtained by prebaking was dissolved in a 2.38 wt% aqueous solution of tetramethylammonium hydroxide at a rate of 200 Å/sec or more and 3000 Å/sec or less. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I772411-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I611268-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I624719-B |
| priorityDate | 2011-05-20^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
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