http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201439668-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-80 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-22 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-46 |
| filingDate | 2013-11-13^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d73fddeb26fc0eb13bbd594190fec5ec http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_159680f94ee0116031ed2d26c72e0c48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d7f92babb0f9c38eef9843205cd3f751 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d5e9102a099ce79ed6ad0077b47a6456 |
| publicationDate | 2014-10-16^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201439668-A |
| titleOfInvention | Method of etching a layer of an extreme ultraviolet material used to form a reticle |
| abstract | Methods and apparatus for etching a reticle are provided herein. In one embodiment, a method of etching an ARC layer or an absorber layer disposed on a reticle includes the steps of: transporting a film stack into an etch chamber having a partially exposed ARC layer or absorption through the patterned layer a layer; providing a gas mixture into the processing chamber, the gas mixture comprising at least one fluorine-containing gas; applying a source RF power to form a plasma from the gas mixture; applying a first form of RF bias power to the substrate for a first period of time; Applying an RF bias power of the second form that is detached from the substrate for a second period of time; and etching the ARC layer or the absorbing layer through the patterned layer in the presence of the plasma. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10818479-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I705483-B |
| priorityDate | 2012-11-30^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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