| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_38ed56a4b4e8e2315b2b3308bffedb3f |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0332
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0276 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-24 |
| filingDate |
2017-10-19^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2020-11-11^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_be414c9c5741d522aaf0ddd7ce1a379d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_45d810bca8413f7a789db00ec8997e5d |
| publicationDate |
2020-11-11^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I710004-B |
| titleOfInvention |
Reflection mode photomask and fabrication method therefore |
| abstract |
A method of fabricating a mask blank includes depositing a reflective multilayer over a substrate, depositing a capping layer over the reflective multilayer, depositing an absorber layer over the capping layer, and depositing an anti-reflective coating (ARC) layer over the absorber layer. The ARC layer is a single material film. |
| priorityDate |
2017-08-22^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |