| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8cf8d77ac0eff1767b22d2fb9445b64d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B9-00 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6719
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4408
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B7-0057
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68771
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68764
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-488 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-687
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B9-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 |
| filingDate |
2015-03-06^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2019-03-26^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9df802dfb0f256528706d85192532077
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1f59dbb7e3eb883200a824649fb4a6fb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e2ef7d7a2aa4e547f7a375367eeda04f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2746bfc6fe43a00547dada1e6adea678
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_04818711065c8252afc15d3f7bfec270
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0dd8866f432d33b5179f7148e916619a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3f58ca87e0f198afc8e3a00c95b86b94
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d3b4b1151d9f01273e5648480b15c22a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9b63c3627f3638f7149a83912995fd4e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1461cc3a6d15988119d4620e12f9ba7f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4fe2ed0e1fac2c54870d97f18a272eef |
| publicationDate |
2019-03-26^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-10240236-B2 |
| titleOfInvention |
Clean resistant windows for ultraviolet thermal processing |
| abstract |
Apparatuses and methods for cleaning a semiconductor processing chamber is provided. The semiconductor processing chamber may include a UV radiation source, a substrate holder, and a UV transmissive window. The UV transmissive window may include one or multiple panes. One or more panes of the UV transmissive window may be non-reactive with fluorine containing chemistries. In multi-pane windows a purge gas flow path may be formed in the gap between windows. A purge gas may be flowed through the purge gas flow path to prevent process gases used in the chamber interior from reaching one or more panes of the UV transmissive window. |
| priorityDate |
2015-03-06^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |