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publicationDate 2011-11-22^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-8062983-B1
titleOfInvention Creation of porosity in low-k films by photo-disassociation of imbedded nanoparticles
abstract Porous dielectric layers are produced by embedding and removing nanoparticles in composite dielectric layers. The pores may be produced after the barrier material, the metal or other conductive material is deposited to form a metallization layer. In this manner, the conductive material is provided with a relatively smooth continuous surface on which to deposit.
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