http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2002027291-A1

Outgoing Links

Predicate Object
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-0002
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76834
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76885
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76888
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-53223
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-532
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-522
filingDate 1999-04-27^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c9dee3b71630e936a8e2721452f119a1
publicationDate 2002-03-07^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2002027291-A1
titleOfInvention Semiconductor device for preventing corrosion of metallic featues
abstract A semiconductor device and a manufacturing method thereof which enable corrosion of an Al-wiring to be prevented in the case where insulating film containing fluorine is in use. Al-wiring is formed on a silicon substrate, while etching Aluminum with photoresist as a mask. In this process, a natural oxide film is formed on side wall of the Al-wiring. There is eliminated the natural oxide film by physical etching due to inert gas such as argon and so forth or reactive etching such as BCl 3 and so forth under atmosphere of reduced pressure or a few existence of oxygen. In succession, there is formed high quality aluminum oxide film 6 a on the Al-side wall, while introducing oxygen or oxygen radical in a state of not breaking a vacuum. There is formed a fluorine contained interlayer insulating film 7 on a barrier of high quality aluminum oxide film 6 a.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112563195-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9735351-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007155027-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010096722-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7645618-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7863177-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009050468-A1
priorityDate 1998-04-30^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID9989226
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457707758
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23968
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523291
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5359268
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559562
http://rdf.ncbi.nlm.nih.gov/pubchem/anatomy/ANATOMYID1969
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID297
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458357694
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24261
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559478
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419491804
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559581
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID977
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24823
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID14917
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID451818717
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559541
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5461123

Showing number of triples: 1 to 47 of 47.