http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006243919-A1

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filingDate 2005-04-27^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2006-11-02^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2006243919-A1
titleOfInvention TEM sample preparation from a circuit layer structure
abstract A method of TEM sample preparation from a circuit layer structure, the method comprising electron-beam assisted deposition of a first protective layer over a site of interest of the circuit layer structure; ion-beam assisted deposition of a second protective layer over the first protective layer; and ion-beam milling at the site of interest through the first and second protective layers.
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2008132734-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8143594-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2012073009-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2008132734-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010276607-A1
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