http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016045942-A1

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filingDate 2015-08-17^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2016-02-18^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2016045942-A1
titleOfInvention Method and apparatus for removing residue layer
abstract A method of removing a residue layer formed on a side surface of each of a plurality of convex-shaped structure which stands together on a surface of a substrate or a side surface of a concave-shaped structure formed on the substrate, includes disposing an electrostatic lens between the substrate and a charged particle irradiation mechanism which linearly irradiates a beam of charged particles onto the substrate. The electrostatic lens diverges the beam of charged particles.
priorityDate 2014-08-18^^<http://www.w3.org/2001/XMLSchema#date>
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