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filingDate 2017-04-03^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2017-07-20^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2017207321-A1
titleOfInvention Integrated vertical nanowire memory
abstract A nanowire structure includes successive crystalline nanowire segments formed over a semiconductor substrate. A first crystalline segment formed directly on the semiconductor substrate provides electrical isolation between the substrate and the second crystalline segment. Second and fourth crystalline segments are each formed from a p-type or an n-type semiconductor material, while the third crystalline segment is formed from a semiconductor material that is oppositely doped with respect to the second and fourth crystalline segments.
priorityDate 2015-12-10^^<http://www.w3.org/2001/XMLSchema#date>
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