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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30625
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-308
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00
filingDate 1971-10-26^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1973-11-27^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7b77482e5fa6b748894d648e36884658
publicationDate 1973-11-27^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-3775201-A
titleOfInvention Method for polishing semiconductor gallium phosphide planar surfaces
abstract An improved method for polishing gallium phosphide planar surfaces is disclosed comprising positioning gallium phosphide wafers or slices in close adjacency to a polishing medium providing a relative motion between said wafer and polishing medium while providing a controlled predetermined flow of OBr ions to said wafers and polishing medium and continuing the relative motion until the wafer surface is polished to a smooth and featureless condition whereupon the wafers are washed and removed from the polishing mechanism.
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priorityDate 1971-10-26^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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