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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D3-38
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D3-38
filingDate 1974-11-21^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1976-05-11^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a93158bc557031d885dfc7d51fa8de5b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0f099a77143d7f49eee5807799bedcb2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e0e14b2c632b59154ce45355e2c2a9dc
publicationDate 1976-05-11^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-3956079-A
titleOfInvention Electrodeposition of copper
abstract This invention relates to novel compositions and to a process for electrodepositing copper from an aqueous acidic copper plating bath containing at least one member independently selected from each of the following two groups:
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priorityDate 1972-12-14^^<http://www.w3.org/2001/XMLSchema#date>
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