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publicationDate 1979-08-21^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-4165294-A
titleOfInvention Phenol-free and chlorinated hydrocarbon-free photoresist stripper comprising surfactant and hydrotropic aromatic sulfonic acids
abstract Stripping solutions, free from phenol and chlorinated hydrocarbon compounds, comprising a surfactant alkylarylsulfonic acid having 12-20 carbons, a hydrotropic aromatic sulfonic acid having 6-9 carbons and a halogen-free aromatic hydrocarbon solvent with a boiling point above 150 DEG C. The stripping compositions effectively remove organic polymeric substances from inorganic substrates and are substantially clear water rinsable.
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