| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_031668c5e71aff77485758570eccc4cf |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D1-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-187
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31133
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-426
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-2068 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D1-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D17-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D17-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D11-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 |
| filingDate |
2003-12-23^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2007-02-27^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6819d40b8849fa8df6989ed70b879c0a |
| publicationDate |
2007-02-27^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7183245-B2 |
| titleOfInvention |
Stripper for cured negative-tone isoprene-based photoresist and bisbenzocyclobutene coatings |
| abstract |
A chemical stripping solvent composition is provided for removing cured polymeric isoprene and bisbenzocyclobutene (BCB) substances from an inorganic substrate. The stripping composition comprises about 20 to about 30 weight percent anisole, about 20 to about 30 weight percent mesitylene, about 35 to about 55 weight percent of an alkylbenzene sulfonic acid, and may contain methane sulfonic acid (MSA) at 3 to about 10 weight percent, added to remove BCB in the full-cured state. Also provided is a method for stripping cured polymeric organic substances by contacting the polymeric organic substance with the stripping solvent composition at a given temperature and for a period of time sufficient to essentially dissolve and remove cured polymeric substances. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8309502-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9029268-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8940104-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010242998-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11660260-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010242999-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8444768-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8916338-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8614053-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8389455-B2 |
| priorityDate |
2003-12-23^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |